Precisely engineered CMP slurries with optimised oxidising agents, corrosion inhibitors, stabilisers, and surfactants tailored to your specific wafer material system and process requirements.
Machine learning and Bayesian optimisation to find ideal CMP parameters — reducing development cycles from months to days while improving yield and reducing cost.
On-site demo centre with industry-standard Mirra® and Reflex® platforms. Validate slurry-on-tool performance at costs below £110–150 per SiC wafer.
Our global application engineering and R&D teams deliver tailored solutions optimising your total cost of ownership.
Contact Us